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Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace

Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace

    • Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace
  • Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace

    Product Details:

    Place of Origin: China
    Brand Name: Brother Furnace
    Certification: CE
    Model Number: BR-PECVD

    Payment & Shipping Terms:

    Minimum Order Quantity: 1 Set
    Price: Negotiation
    Packaging Details: Strong wooden box for global shipping
    Delivery Time: 7-21 Working days
    Payment Terms: L/C, T/T, Western Union
    Supply Ability: 200 Sets per month
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    Detailed Product Description
    Max Temperature: 1200℃ Normal Vacuum: -0.1MPa
    Max Vacuum: Configuration Molecular Pump, Vacuum 7x10-4 Pa (Optional) Flange: 304 Stainless Steel Sealing Flange
    Over-temperature Protection: Automatic Power-off When The Temperature Exceeds The Allowable Set Value Safety Protection: Automatically Power Off When The Furnace Body Leaks
    Furnace Structure: Double Layer Steel Dual Cooling Fan, Surface Temperature Below 50℃ Max Heating Rate: 20°C /min
    Temperature Control: 50 Segments Programmable And Auto Control Furnace Tube: Quartz Tube
    Application: Plasma Enhanced Chemical Vapor Deposition Furnace
    High Light:

    rotating tube furnace


    quartz tube furnace

    Lab Plasma Enhanced Chemical Vapor Deposition Furnace up to 1200 Degree
    Intelligent PECVD Introduction:
    PECVD system is designed to decrease the reaction temperature of traditional CVD. It installed RF induction equipment in front of traditional CVD to ionize reacting gas, so the plasma is generated. Plasma's high activity is Reaction is accelerated due to the high activity of plasma. So, this system is called PECVD.
    This model is the newest product, it synthesized the advantages of most tube PECVD systems, and added a pre-heating zone in the front of the PECVD system. Tests showed that the deposition speed is quicker, the film quality is better, holes are less, and won't crack. AISO fully automatic intelligent control system is independently designed by our company, it is more convenient to operate and its function is more powerful.
    Wide application range: metal film, ceramic film, composite film, the continuous growth of various films. Easy to increase function, can expand plasma cleaning etch and other functions
    Main Feature:

    • High film deposition rate: RF glow technology, greatly increasing the deposition rate of the film, the deposition rate can reach 10Å / S
    • High area uniformity: Advanced multi-point RF feeding technology, special gas path distribution, and heating technology, etc., make the film uniformity index reach 8%
    • High consistency: using the advanced design concept of the semiconductor industry, the deviation between the substrates of one deposition is less than 2%
    • High process stability: Highly stable equipment ensures a continuous and stable process

    Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace 0
    Standard Spares:

    • Plugging tube 4 pcs
    • Furnace tube 1 pc
    • Vacuum pump 1 pc
    • Vacuum sealing flange 2 sets
    • Vacuum gauge 1 pc
    • Gas delivery & vacuum pump
    • RF plasma equipment

    Optional Spares:

    • Quick release flange, Three-way flange
    • 7 inch HD touch scree

    Plasma Enhanced Chemical Vapor Deposition Furnace Standard specification:

    1. Heating System
    Max.temperature1200℃ (1 hour)
    Working temperature≤1100℃
    Chamber sizeΦ100*1650mm (Tube diamater is customizable)
    Chamber materialHigh purity alumina fiber board
    ThermocoupleK type
    Temperature control

    ● 50 programmable segments for precise control of heating rate, cooling rate and dwell time.

    ● Built in PID Auto-Tune function with overheating & broken thermocouple broken protection.

    ● PLC automatic control system by PC controller inside.

    ● The temperature control system, sliding system (Time and Distance) could be controlled by program.

    Heating length440mm
    Constant heating length200mm
    Heating elementResistance wire
    Power supplySingle phase, 220V, 50Hz
    Rated power9kW
    2. RF Plasma Source
    RF frequency13.56 MHz±0.005%
    Output power500W
    Max reflect power500W
    RF output interface50 Ω, N-type, female
    Power stability±0.1%
    Harmonic component≤-50dbc
    Supply voltage/FrequencySingle phase AC220V 50/60HZ
    Whole efficiency>=70%
    Power factor>=90%
    Cooling methodForced air
    3. Three precision mass flowmeters control system
    External dimension600x600x650mm
    Connector typeSwagelok SS joint
    Standard range (N2)0~100sccm, 0~200sccm, or customizable
    Response time

    Gas property: 1~4 Sec;
    Electrical property: 10 Sec

    Pressure range0.1~0.5 MPa
    Display4 digit display
    Ambient temperature5~45 high purity gas
    Pressure gauge-0.1~0.15 MPa, 0.01 MPa/unit
    Stop valveΦ6
    Polish SS tubeΦ6
    Low vacuum system included

    Why Brother's Lab Plasma Enhanced Chemical Vapor Deposition Furnace?

    • Manufacturer with 10+ years' experience
    • Best quality
    • Customized design
    • Experienced workers
    • Big factory

    Customers from more than 30 countries choose us

    • Satisfied customers offer proof of our commitment to excellent design, quality and cost efficiency.

    Best service, Fast response

    • Free design for special furnace
    • Free technical support for the lifetime
    • Free sample test

    If you're interested in our Plasma Enhanced Chemical Vapor Deposition Furnace, contact us now to get a quote!

    Contact Details
    Zhengzhou Brother Furnace Co.,Ltd

    Contact Person: li

    Send your inquiry directly to us
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    Building 10, Henan National University Science and Technology Park, Zhengzhou, China.
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