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Zhengzhou Brother Furnace Co.,Ltd
Zhengzhou Brother Furnace Co.,Ltd

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Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace

Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace

  • Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace
Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace
Product Details:
Place of Origin: China
Brand Name: Brother Furnace
Certification: CE
Model Number: BR-PECVD
Payment & Shipping Terms:
Minimum Order Quantity: 1 Set
Price: Negotiation
Packaging Details: Strong wooden box for global shipping
Delivery Time: 7-21 Working days
Payment Terms: L/C, T/T, Western Union
Supply Ability: 200 Sets per month
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Detailed Product Description
Max Temperature: 1200℃ Normal Vacuum: -0.1MPa
Max Vacuum: Configuration Molecular Pump, Vacuum 7x10-4 Pa (Optional) Flange: 304 Stainless Steel Sealing Flange
Over-temperature Protection: Automatic Power-off When The Temperature Exceeds The Allowable Set Value Safety Protection: Automatically Power Off When The Furnace Body Leaks
Furnace Structure: Double Layer Steel Dual Cooling Fan, Surface Temperature Below 50℃ Max Heating Rate: 20°C /min
Temperature Control: 50 Segments Programmable And Auto Control Furnace Tube: Quartz Tube
Application: Plasma Enhanced Chemical Vapor Deposition Furnace
High Light:

rotating tube furnace


quartz tube furnace

Lab Plasma Enhanced Chemical Vapor Deposition Furnace up to 1200 Degree
Intelligent PECVD Introduction:
PECVD system is designed to decrease the reaction temperature of traditional CVD. It installed RF induction equipment in front of traditional CVD to ionize reacting gas, so the plasma is generated. Plasma's high activity is Reaction is accelerated due to the high activity of plasma. So, this system is called PECVD.
This model is the newest product, it synthesized the advantages of most tube PECVD systems, and added a pre-heating zone in the front of the PECVD system. Tests showed that the deposition speed is quicker, the film quality is better, holes are less, and won't crack. AISO fully automatic intelligent control system is independently designed by our company, it is more convenient to operate and its function is more powerful.
Wide application range: metal film, ceramic film, composite film, the continuous growth of various films. Easy to increase function, can expand plasma cleaning etch and other functions
Main Feature:

  • High film deposition rate: RF glow technology, greatly increasing the deposition rate of the film, the deposition rate can reach 10Å / S
  • High area uniformity: Advanced multi-point RF feeding technology, special gas path distribution, and heating technology, etc., make the film uniformity index reach 8%
  • High consistency: using the advanced design concept of the semiconductor industry, the deviation between the substrates of one deposition is less than 2%
  • High process stability: Highly stable equipment ensures a continuous and stable process

Automatic Lab Tube Furnace Enhanced Chemical Vapor Deposition Furnace 0
Standard Spares:

  • Plugging tube 4 pcs
  • Furnace tube 1 pc
  • Vacuum pump 1 pc
  • Vacuum sealing flange 2 sets
  • Vacuum gauge 1 pc
  • Gas delivery & vacuum pump
  • RF plasma equipment

Optional Spares:

  • Quick release flange, Three-way flange
  • 7 inch HD touch scree

Plasma Enhanced Chemical Vapor Deposition Furnace Standard specification:

1. Heating System
Max.temperature1200℃ (1 hour)
Working temperature≤1100℃
Chamber sizeΦ100*1650mm (Tube diamater is customizable)
Chamber materialHigh purity alumina fiber board
ThermocoupleK type
Temperature control

● 50 programmable segments for precise control of heating rate, cooling rate and dwell time.

● Built in PID Auto-Tune function with overheating & broken thermocouple broken protection.

● PLC automatic control system by PC controller inside.

● The temperature control system, sliding system (Time and Distance) could be controlled by program.

Heating length440mm
Constant heating length200mm
Heating elementResistance wire
Power supplySingle phase, 220V, 50Hz
Rated power9kW
2. RF Plasma Source
RF frequency13.56 MHz±0.005%
Output power500W
Max reflect power500W
RF output interface50 Ω, N-type, female
Power stability±0.1%
Harmonic component≤-50dbc
Supply voltage/FrequencySingle phase AC220V 50/60HZ
Whole efficiency>=70%
Power factor>=90%
Cooling methodForced air
3. Three precision mass flowmeters control system
External dimension600x600x650mm
Connector typeSwagelok SS joint
Standard range (N2)0~100sccm, 0~200sccm, or customizable
Response time

Gas property: 1~4 Sec;
Electrical property: 10 Sec

Pressure range0.1~0.5 MPa
Display4 digit display
Ambient temperature5~45 high purity gas
Pressure gauge-0.1~0.15 MPa, 0.01 MPa/unit
Stop valveΦ6
Polish SS tubeΦ6
Low vacuum system included

Why Brother's Lab Plasma Enhanced Chemical Vapor Deposition Furnace?

  • Manufacturer with 10+ years' experience
  • Best quality
  • Customized design
  • Experienced workers
  • Big factory

Customers from more than 30 countries choose us

  • Satisfied customers offer proof of our commitment to excellent design, quality and cost efficiency.

Best service, Fast response

  • Free design for special furnace
  • Free technical support for the lifetime
  • Free sample test

If you're interested in our Plasma Enhanced Chemical Vapor Deposition Furnace, contact us now to get a quote!

Contact Details
Zhengzhou Brother Furnace Co.,Ltd

Contact Person: li

Tel: +8613526693072

Send your inquiry directly to us
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