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Zhengzhou Brother Furnace Co.,Ltd
Zhengzhou Brother Furnace Co.,Ltd

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1200℃ Vacuum Tube Furnace Plasma Enhanced LPCVD Furnace With Vacuum Pump

1200℃ Vacuum Tube Furnace Plasma Enhanced LPCVD Furnace With Vacuum Pump

  • 1200℃ Vacuum Tube Furnace Plasma Enhanced LPCVD Furnace With Vacuum Pump
1200℃ Vacuum Tube Furnace Plasma Enhanced LPCVD Furnace With Vacuum Pump
Product Details:
Place of Origin: China
Brand Name: Brother Furnace
Certification: CE
Model Number: BR-PECVD
Payment & Shipping Terms:
Minimum Order Quantity: 1 Set
Price: Negotiation
Packaging Details: Strong wooden box for global shipping
Delivery Time: 7-21 Working days
Payment Terms: L/C, T/T, Western Union
Supply Ability: 200 Sets per month
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Detailed Product Description
Max Temperature: 1200℃ Normal Vacuum: -0.1MPa
Max Vacuum: Configuration Molecular Pump, Vacuum 7x10-4 Pa (Optional) Flange: 304 Stainless Steel Sealing Flange
Over-temperature Protection: Automatic Power-off When The Temperature Exceeds The Allowable Set Value Safety Protection: Automatically Power Off When The Furnace Body Leaks
Furnace Structure: Double Layer Steel Dual Cooling Fan, Surface Temperature Below 50℃ Max Heating Rate: 20°C /min
Temperature Control: 50 Segments Programmable And Auto Control Furnace Tube: Quartz Tube
Application: Plasma Enhanced LPCVD
High Light:

rotating tube furnace


quartz tube furnace

1200℃ Plasma Enhanced LPCVD Furnace with Vacuum Pump
Intelligent LPCVD Introduction:
PECVD system is designed to decrease the reaction temperature of traditional CVD. It installed RF induction equipment in front of traditional CVD to ionize reacting gas, so the plasma is generated. Plasma's high activity is Reaction is accelerated due to the high activity of plasma. So, this system is called PECVD.
This model is the newest product, it synthesized the advantages of most tube PECVD systems, and added a pre-heating zone in the front of the PECVD system. Tests showed that the deposition speed is quicker, the film quality is better, holes are less, and won't crack. AISO fully automatic intelligent control system is independently designed by our company, it is more convenient to operate and its function is more powerful.
Wide application range: metal film, ceramic film, composite film, the continuous growth of various films. Easy to increase function, can expand plasma cleaning etch and other functions
Main Feature:

  • High film deposition rate: RF glow technology, greatly increasing the deposition rate of the film, the deposition rate can reach 10Å / S
  • High area uniformity: Advanced multi-point RF feeding technology, special gas path distribution, and heating technology, etc., make the film uniformity index reach 8%
  • High consistency: using the advanced design concept of the semiconductor industry, the deviation between the substrates of one deposition is less than 2%
  • High process stability: Highly stable equipment ensures a continuous and stable process

Standard Spares:

  • Plugging tube 4 pcs
  • Furnace tube 1 pc
  • Vacuum pump 1 pc
  • Vacuum sealing flange 2 sets
  • Vacuum gauge 1 pc
  • Gas delivery & vacuum pump
  • RF plasma equipment

Optional Spares:

  • Quick release flange, Three-way flange
  • 7 inch HD touch scree

Lab PECVD Split Tube Furnace Standard specification:

1. Heating System
Max.temperature 1200℃ (1 hour)
Working temperature ≤1100℃
Chamber size Φ100*1650mm (Tube diamater is customizable)
Chamber material High purity alumina fiber board
Thermocouple K type
Temperatureaccuracy ±1℃
Temperature control

● 50 programmable segments for precise control of heating rate, cooling rate and dwell time.

● Built in PID Auto-Tune function with overheating & broken thermocouple broken protection.

● PLC automatic control system by PC controller inside.

● The temperature control system, sliding system (Time and Distance) could be controlled by program.

Heating length 440mm
Constant heating length 200mm
Heating element Resistance wire
Power supply Single phase, 220V, 50Hz
Rated power 9kW
2. RF Plasma Source
RF frequency 13.56 MHz±0.005%
Output power 500W
Max reflect power 500W
RF output interface 50 Ω, N-type, female
Power stability ±0.1%
Harmonic component ≤-50dbc
Supply voltage/Frequency Single phase AC220V 50/60HZ
Whole efficiency >=70%
Power factor >=90%
Cooling method Forced air
3. Three precision mass flowmeters control system
External dimension 600x600x650mm
Connector type Swagelok SS joint
Standard range (N2) 0~100sccm, 0~200sccm, or customizable
Accuracy ±1.5%
Linear ±0.5~1.5%
Repeatability ±0.2%
Response time

Gas property: 1~4 Sec;
Electrical property: 10 Sec

Pressure range 0.1~0.5 MPa
Max.pressure 3MPa
Interface Φ6,1/4''
Display 4 digit display
Ambient temperature 5~45 high purity gas
Pressure gauge -0.1~0.15 MPa, 0.01 MPa/unit
Stop valve Φ6
Polish SS tube Φ6
Low vacuum system included

Why Brother's Lab PECVD Split Tube Furnace?

  • Manufacturer with 10+ years' experience
  • Best quality
  • Customized design
  • Experienced workers
  • Big factory

Customers from more than 30 countries choose us

  • Satisfied customers offer proof of our commitment to excellent design, quality and cost efficiency.

Best service, Fast response

  • Free design for special furnace
  • Free technical support for the lifetime
  • Free sample test

If you're interested in our 1200℃ Plasma Enhanced LPCVD Furnace with Vacuum Pump, contact us now to get a quote!

Contact Details
Zhengzhou Brother Furnace Co.,Ltd

Contact Person: li

Tel: +8613526693072

Send your inquiry directly to us
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